Project overview

The HIPPOCAMP project focuses on a novel manufacturing process required to develop nanocomposites and use them as embedded reinforcements to improve the functional properties of products made of engineered metallic material such as structural components for automotive, aerospace, manufacturing and wind turbine applications.

These industrial components share one common problem: they are subject to intense vibrations which reduce their reliability and durability. Therefore researchers have sought to reduce the impact of forced vibration and chatter by developing material combining high stiffness with high damping capabilities, a property we will refer to as high dynamic stiffness.


The project addresses the development of a scalable industrial process enabling

-The synthesis of new class of nano-composites characterized by their high dynamic stiffness properties at a broad range of temperatures (hereafter called HiDS materials)

- The embedding of nano-composite material on metal or polymer parts, in order to create industrial components with high stiffness-to-weight ratio combined with superior vibration damping property and high thermal stability (hereafter called HiDS components)

Overview of the project process, material and tarjet product

The methodology relies on a bottom-up (additive) technology concept based on three novel approaches:

• PECVD, a plasma-enhanced chemical vapor deposition method using acetylene, oxygen, nitrogen and argon in order to efficiently produce thick layers of material (at high deposition rate) with minimum environmental impact (no use of toxic gases).
• HiPIMS (High-Power Impulse Magnetron Sputtering technology), a physical vapor deposition (PVD) low temperature (100 degrees) method for producing a metal/gas plasma and generating a flux of ionized material from a solid metal source (for better layer coverage on complex shapes).
• A tailored nanostructured composite material fabrication by controlling the pulsed metal plasma discharge characteristics and the metal plasma flow intensity.