The results of HiPIMS process characterisation and optimisation were presented at the biennial 15th International Conference on Plasma Surface Engineering (PSE) in Garmisch-Partenkirchen (Germany) during 11th-16th of September 2016. The PSE conference series is organized by the European Joint Committee on Plasma and Ion Surface Engineering. PSE provides an opportunity to present recent progress in research and development and industrial applications. Its topics span a wide range from fundamentals such as e.g. process modelling and simulation of plasmas or thin film physics, through experimental studies which establish the relationships between process parameters and the structural and functional properties of modified surfaces and/or thin films, towards the application in industrial production. The number of participants from academia and industry exceeds 700 visitors during the each conference. The member of team from the IP-ASCR Dr. Martin Äada presented in form of poster recent results concerning the ion flux and space charge sheath impedance measurements in the reactive HiPIMS plasma. Obtained results proved that simple, industry-friendly ion flux probe is able to control a reactive sputtering process. The probe developed within the HIPPOCAMP project is therefore suitable for optimisation of reactive sputtering process of e.g. CuCNx thin films intended for damping applications. Fruitful discussion with people from academia and industry has helped to disseminate results among HiPIMS community.