Erika

Erika

Created on: 06 October 2016

Project Final meeting in Brussels

The HIPPOCAMP project has come to an end and thanks to the project; there are three results already in the market. During the project, a new plasma generator and a new bias power supply have been developed, now commercialized by Ionautics and a new creping blade monitoring system oriented to the pulp and paper industry commercialized by Lantier. All these new products have been introduced during the meeting, celebrated in on the 28th September in Brussels. Mr. Gustaf Winroth – Project Technical Advisor – congratulated the Consortium and encouraged to put these components on the market.

Created on: 20 September 2016

Design of self-tuneable mass damper for modular fixturing systems

Enhancing dynamic characteristics of fixtures for large workpieces is essential to assure chatter free machining of heavy-duty milling operations. Variable stiffness tuned mass dampers (VSTMD) can effectively improve the dynamic stiffness of modular fixtures by changing their dynamic characteristics. The theory of a new VSTMD concept is presented. Their realisable optimal tuning is determined and the results are compared to the standard constant stiffness TMDs. By means of the developed automatic tuning procedure, stiffness is varied via a rotary spring, while damping is provided by eddy currents. The prototype and the effectiveness of the concept are experimentally validated by heavy-duty milling tests on a modular fixture.

Created on: 20 September 2016

Chatter suppression techniques in metal cutting

The self-excited vibration, called chatter, is one of the main limitations in metal removal processes. Chatter may spoil the surface of the part and can also cause large reduction in the life of the different components of the machine tool including the cutting tool itself. During the last 60 years, several techniques have been proposed to suppress chatter. This keynote paper presents a critical review of the different chatter suppression techniques. Process solutions with design and control approaches are compiled to provide a complete view of the available methods to stabilize the cutting process. The evolution of each technique is described remarking the most important milestones in research and the corresponding industrial application. The selection of the most appropriate technique for each specific chatter problem is also discussed considering various aspects of machining processes.

Created on: 20 September 2016

Hippocamp at 66th CIRP GA 2016

Hippocamp has been present at the 66th CIRP General Assembly celebrated in Guimarães from 21st to 27th August 2016. Jokin Muñoa from Ideko presented two keynotes related to Hippocamp project: Chatter Suppression Techniques in Metal Cutting and Design of self-tuneable mass damper for modular fixturing systems. 

Created on: 20 September 2016

HIPPOCAMP at 15th International Conference on Plasma Surface Engineering

The results of HiPIMS process characterisation and optimisation were presented at the biennial 15th International Conference on Plasma Surface Engineering (PSE) in Garmisch-Partenkirchen (Germany) during 11th-16th of September 2016. The PSE conference series is organized by the European Joint Committee on Plasma and Ion Surface Engineering. PSE provides an opportunity to present recent progress in research and development and industrial applications. Its topics span a wide range from fundamentals such as e.g. process modelling and simulation of plasmas or thin film physics, through experimental studies which establish the relationships between process parameters and the structural and functional properties of modified surfaces and/or thin films, towards the application in industrial production. The number of participants from academia and industry exceeds 700 visitors during the each conference. The member of team from the IP-ASCR Dr. Martin Čada presented in form of poster recent results concerning the ion flux and space charge sheath impedance measurements in the reactive HiPIMS plasma. Obtained results proved that simple, industry-friendly ion flux probe is able to control a reactive sputtering process. The probe developed within the HIPPOCAMP project is therefore suitable for optimisation of reactive sputtering process of e.g. CuCNx thin films intended for damping applications. Fruitful discussion with people from academia and industry has helped to disseminate results among HiPIMS community.

Created on: 19 September 2016

HIPPOCAMP at the AMB Exhibition, Stuttgart

From 13-17th September, the AMB international exhibition for metalworking was held in Stuttgart, Germany. AMB is one of the leading industry trade fairs in the even years and is one of the top 5 trade fairs worldwide for metal-cutting technology. SORALUCE-BIMATEC showcased once again its expertise in manufacturing and the Hippocamp project was promotioned in its stand. Every two years approximately 1,350 exhibitors from almost 30 countries showcase the latest developments in machine tools, precision tools and relevant periphery for metal machining. Over 90,000 visitors are interested in this offering in the centre of Europe's leading high-tech region Stuttgart.

Created on: 30 May 2015

Hippocamp at 42nd European Physical Society Conference on Plasma Physics

The recent results of HIPPOCAMP project were disseminated by Martin Čada from Institute of Physics, ASCR on the 42nd European Physical Society Conference on Plasma Physics. The annual conference organised by the European Physical Society is focused on presentation of recent achievements in the basic research on the fusion and low-temperature plasmas. This year the conference was held in historic heart of Lisbon – in Cultural Centre of Belém. According to organisers information more than 750 participants took part in the 42nd conference. Martin Čada during his oral presentation in the joint Low-temperature and Dusty Plasmas session presented recent achievements on advanced diagnostics of technological discharge in both the small-scale and industrial scale deposition systems during the hybrid PVD-PECVD process involving HiPIMS operation of discharge. During the presentation obtained results on a heating flux, ion flux and ionised fraction of depositing particles as measured for different magnetic field configurations when HiDS films are deposited were discussed. Obtained findings implied necessity to optimise the sputtering magnetron magnetic field together with HiPIMS parameters to reach required results of HIPPOCAMP project. One can be remark that presented findings elicited a positive response from audience.

Created on: 12 July 2016

Hippocamp at 7th International Conference on HIPIMS

The team from the Institute of Physics, ASCR represented by Martin Čada participated at the annual International Conference on HIPIMS. Since the year 2010 the conference on Fundamentals and Industrial Applications of HIPIMS has brought scientist from academia and industrial partners together to learn more about new trends in HiPIMS technology. This year the conference was held in Sheffield (UK) one of the largest towns in UK. The Sheffield became famous thanks to cutlery industry and today usual crucible steel or stainless steel were invented here. Academia institutions in Sheffield are focused on application-oriented research and development for machinery industry too. The conference organisers have welcome more than 100 participants this year. Martin Čada during his oral presentation spoke about a new approach in controlling and characterisation of reactive sputtering process, mainly in HiPIMS. This method has been developed in cooperation of IP ASCR and Ionautics. The presentation showed that proposed technique is suitable for stabilisation of reactive deposition process in so-called the transition region of hysteresis curve of process parameters, which is important for proper optimisation of deposition process within the HIPPOCAMP project. Presented results attracted attention of audience as proved by fruitful discussion after the presentation and during coffee breaks

Created on: 06 June 2016

Time-resolved ion flux and impedance measurements for process characterization in reactive high-power impulse magnetron sputtering

Scientific pubication by IONAUTICS and IP-ASCR on Time-resolved ion flux and impedance measurements for process characterization in reactive high-power impulse magnetron sputtering. More information: http://scitation.aip.org/content/avs/journal/jvsta/34/4/10.1116/1.4953033

Created on: 04 May 2016

Analytical expressions for chatter analysis in milling operations with one dominant mode

Publication by Ideko on Analytical expressions for chatter analysis in milling operations with one dominant mode. More information: http://www.sciencedirect.com/science/article/pii/S0022460X16300499

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